Patents

US9725338: Vortex diodes as reactors and effluent treatment devices

The invention discloses device that can generate a strong vortex in the vortex chamber which significantly enhances rate of reactions and effectiveness of wastewater treatment. The invention discloses vortex diodes with or without inserts/stabilizers as continuous flow reactors to induce cavitation to generate radicals which reduce Chemical Oxygen Demand (COD), ammoniacal nitrogen and color of wastewater effectively in effluent treatments.

Filing Date: 03-08-2016

Issue Date: 08-08-2017

Applicant: CSIR-National Chemical Laboratory (CSIR-NCL), Pune

Patent No: US9725338

Application No: 15/227428

Inventor(s): Vivek Vinayak Ranade; Amol Arvind Kulkarni; Vinay Manoharrao Bhandari

Country: United States of America

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