Patents
In the present invention, a process is provided for the manufacture of a passive energy device (PED) from a hysteretic shear polymer. The hysteretic shear polymer is based on Indian standard natural rubber (ISNR). The hysteretic shear polymer is prepared by processing the ISNR at a temperature in the range of 50 to 100°C with suitable additives, such as china clay, semi-reinforcing furnace (SRF) carbon black, zinc oxide, steric acid, vulcaniser sulphur, tetra methyl thiuram (TMT), 2-mercapto benzo thiazole (MBT) and spikel oil. The hysteretic shear polymer so obtained is fabricated to make a passive energy device (PED). The passive energy device thus obtained provides shear strain as high as 200% linearity and shear strength > 25 kg per sq. cm. which is useful for dissipating shear load due to seismic forces in buildings.